Fused Silica

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Fused Silica is formed by chemical combination of silicon and oxygen. Fused Silica is perfect optical material due to its good UV and IR transmission, low coefficient of thermal expansion. It has high stability and resistance to thermal shock over large temperature excursions, wide temperature operating range and high laser damage threshold.  

Fused Silica Properties:

  • Transmission Range: 185 nm~2500 nm
  • Thermal Expansion Coefficient: 0.54X10-6/K
  • Density: 2.20 g/cm3

Transmission Range:

 
Physical and Optical Properties
Hardness
5.5 - 6.5 Mohs' Scale 570 KHN 100
Design Tensile Strength
4.8x107 Pa (N/mm2) (7000 psi)
Design Compressive Strength
Greater than 1.1x109 Pa (160,000 psi)
Bulk Modulus
3.7x1010 Pa (5.3x106 psi)
Rigidity Modulus
3.1x1010 Pa (4.5x106 psi)
Young's Modulus
7.2x10-10 Pa (10.5x106 psi)
Poisson's Ratio
0.17
Coefficient of Thermal Expansion
5.5x10-7cm/cm.C (20C-320C)
Thermal Conductivity
1.4 W/m.C
Specific Heat
670 J/kg.C
Softening Point
1683C
Annealing Point
1215C
Strain Point
1120C
Electrical Receptivity
7x107 ohm.cm (350C)
Dielectric Properties (20C and 1 MHz)
Constant
Strength
Loss Factor
Dissipation Factor

3.75
5x107 V/m
Less than 4x10-4
Less than 1x10-4
Velocity of Sound-Shear Wave
3.75x103 m/s
Velocity of Sound/Compression Wave
5.90x103 m/s
Sonic Attenuation
Less than 11 db/m MHz
Permeability Constants (cm3mm/cm2 sec cm of Hg)
Helium
Hydrogen
Deuterium
Neon

(700C)
210x10-10
21x10-10
17x10-10
9.5x10-17

Chemical Stability (except hydrofluoric)
High resistance to water and acids

 

    

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